Arunajatesan
S., Carim A. H. Symmetry and Crystal Structure
of Ti3SiC2
// Mater. Lett. - 1994. - 20(5-6). - 319-324.
Convergent beam electron diffraction (CBED)
and x-ray diffractometry (XRD) were used to examine the symmetry,
structure and lattice parameters of Ti3SiC2.
The CBED anal. confirms that the material is hexagonal with a point
group of 6/mmm. The XRD diffraction peak positions and intensities
agree with calcns. based on previously proposed at. positions.
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Chen
H. K., Lin C. I., Lee C. Kinetics of the Reduction
of Carbon / Alumina Powder Mixture in a Flowing Nitrogen Stream //
J. Am. Ceram. Soc. - 1994. - 77(7). - 1753-1756.
The reduction of carbon / alumina powder mixture
in a flowing nitrogen stream was investigated by wight loss measurement
and X-ray diffraction. Experimental results indicated that the reaction
rate could be increased by increasing the nitrogen flow rate, weight
ratio of C / Al2O3, or reaction temperature.
The rate was also found to be increased by decreasing the sample size,
the grain sizes of carbon or alumina oxide, or initial bulk density.
Empirical expressions of consumption rates of Al2O3
and C as well as production rate of AlN have been determined.
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Komarenko
P., Clark D. E. Synthesis of Ti3SiC2-based
Materials Using Microwave-Initiated SHS //
Ceram. Eng. Sci. Proc. - 1994. - 15(5). - 1028-35.
Prepn. and characterization of ceramic materials
in the Ti-Si-C system are presented. Mixts. of titanium, silicon and
carbon powders were ignited by microwave energy. Powders prepd. by
conventional SHS and microwave-initiated SHS were compared. Compositional
characteristics of these powders were detd. using X-ray diffraction.
Conventionally-ignited SHS compacts, with no sustainable heating after
ignition, resulted in a product with a large fraction of TiC. Conventionally-ignited
SHS samples that were sustainably heated for up to 30 min at 1400-1450°
resulted in a product composed of TiC with traces of Ti3SiC2.
Samples ignited and sustainably heated with microwave energy for up
to 30 min at 1400-1450° resulted in a product that maintained a high
fraction of the Ti3SiC2 phase. Microwave energy
seemed to inhibit the decompn. and actually favor the formation of
the Ti3SiC2 phase starting from Ti-Si-C powder
mixts.
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Lihrmann J.-M. SiCAlON Ceramics / Encyclopedia
of Advanced Materials. Vol. 4. - Pergamon Press, 1994. - 2451-2454.
[no
abstract]
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Lis J., Pampuch R. Sinterable Ceramic Powders Prepared
by SHS, Their Densifications and Final Products // Trans. Mater.
Res. Soc. Jpn. - 1994. - 14A. - 603-608.
[no
abstract]
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Lis J. Sinterable Powders of Covalent Compounds
Prepared by Self-Propagating High-Temperature Synthesis (SHS)
/ Pr. Kom. Nauk Ceram., Ceram. (Pol. Akad. Nauk). - 44. - 1994. (Polish). |
Okano
T., Yano T., Iseki T. Synthesis and Mechanical
Properties of Ti3SiC2
Ceramic // Trans. Mater. Res. Soc. Jpn.. -
1994. - 14A. - 597-600.
[no
abstract]
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Racault
C., Langlais F., Bernard C. On the Chemical
Vapor Deposition of Ti3SiC2
from TiCl4-SiCl4-CH4-H2
Gas Mixtures. Part I. A Thermodynamic Approach
// J. Mater. Sci. - 1994. - 29(19). - 5023-5040.
In the ternary system Ti-Si-C, the ternary
compd. Ti3SiC2 seems to exhibit promising thermal
and mech. properties. Its synthesis as a thin film from the vapor
phase is very difficult owing to the complexity of the system. A contribution
to the knowledge of the chem. vapor deposition of Ti3SiC2
from a TiCl4-SiCl4-CH4-H gas mixt.
is proposed on the basis of a thermodn. approach. This approach is
based on a reliable estn. of Ti3SiC2 thermodn.
data in good accordance with recent exptl. results on its thermal
stability. A first equil. calcn. for the deposition on an inert substrate
shows the influence of the exptl. parameters on the compn. of both
the deposit and the gas phase. As a result, the deposition of Ti3SiC2
can be favored by an excess of TiCl4 (.gtoreq.45%), a rather
low pressure (10-20 kPa), high temp. (>= 1273 K), and low H diln.
ratio. On the basis of equil. calcns. for various substrates, complex
mechanisms of Ti3SiC2 deposition are pointed
out, with intermediate steps of substrate consumption, e.g., the formation
of TiC from a C substrate or TiSi2 from a Si substrate.
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Racault
C., Langlais F., Naslain R., Kihn Y. On the
Chemical Vapor Deposition of Ti3SiC2
from TiCl4-SiCl4-CH4-H2
Gas Mixtures. Part II. An Experimental Approach //
J. Mater. Sci. - 1994. - 29(15). - 3941-3948.
An exptl. study of the deposition of Ti3SiC2-based
ceramics from TiCl4-SiCl4-CH4-H2
gaseous precursors is carried out under conditions chosen on the basis
of a previous thermodn. approach, i.e., a temp. of 1100 °C, a total
pressure of 17 kPa, various initial compns. and substrates of silicon
or carbon. Ti3SiC2 is deposited within a narrow
compn. range and never as a pure phase. A two-step deposition process
is obsd., in agreement with the thermodn. calcns. For a silicon substrate,
TiSi2 is formed as an intermediate phase from consumption
of Si by TiCl4 and then is carburized by CH4
into Ti3SiC2. For a carbon substrate, the first
step is the formation of TiCx either from consumption of carbon by
TiCl4 or by reaction between TiCl4 and CH4 and
then TiCx reacts with the gaseous mixt. to give rise to
Ti3SiC2. In most cases, Ti3SiC2
is obtained as small hexagonal plates oriented perpendicular to the
substrate surface. These nano- or micro-crystals are usually co-deposited
with TiCx and to a lesser extent SiC, and their size is
increased by increasing the diln. of the gaseous mixt. in hydrogen.
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Racault
C., Langlais F., Naslain R. Solid-State Synthesis
and Characterization of the Ternary Phase of Ti3SiC2
// J. Mater. Sci. - 1994. - 29(13). - 3384-3392.
Ti3SiC2 is the only
true ternary compd. in the Ti-Si-C system. It seems to exhibit promising
thermal and mech. behavior. With the exception of its layered crystal
structure, most of its properties are unknown, owing to the great
difficulty of synthesis. A new procedure of solid-state synthesis
with several steps is proposed, which results in Ti3SiC2
with less than 5 at.% TiC. Ti3SiC2 is stable
at least up to 1300 °C. Beyond this temp., it can decomp. with formation
of non-stoichiometric titanium carbide and gaseous silicon, with kinetics
highly dependent on the nature of the surroundings. As an example,
graphite can initiate this process by reacting with silicon, while
alumina does not favor the decomp. which remains very slow. The oxidn.
of Ti3SiC2 under flowing oxygen starts at 400
°C with formation of anatase-type TiO2 film, as studied
by TGA, XRD, SEM and AES. At 650-850 °C, both rutile and anatase are
formed, rapidly forming protective films and giving rise to slow formation
of SiO2 and more TiO2. The oxidn. kinetics is
slower than for TiC, owing to a protecting effect of silica. By increasing
the temp., both oxidn. processes (i.e. direct reaction and diffusion
through oxide layers) are activated and an almost total oxidn. is
achieved at 1050-1250 °C resulting in titania (rutile) and silica
(cristobalite).
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Schneider
A. , Schober R. New Materials in the AlCON-System
/ International Conference Ceramic Processing Science and Technology,
11-14.09.1994, Friedrichshafen (Germany).
[html (Poster located on
web-site of Fraunhofer Institute of Ceramic Technologies and Sintered
Materials)]
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Tamai
F., Naka M. The Role of Ti in SiC / SiC Joint
Brazed with Cu-Ti Fillermetals // Trans. Mater. Res. Soc. Jpn.
- 1994. - 16B. - 1113-1116.
[no
abstract]
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Tsuchida
T., Hasegawa T., Inagaki M. Self-Combustion
Reaction Induced by Mechanical Activation: Formation of Aluminum Nitride
from Aluminum - Graphite Powder Mixture // J. Am. Ceram. Soc.
- 1994. - 77(12). - 3227-3231.
The powders of aluminum metal and natural
graphite mixed in various molar ratios (Al / C = 7/0 - 0/7) were ground
in a planetary ball mill. When the mixtures thus activated mechanically
were exposed to air, exothermic reactions spontaneously occurred in
two successive steps, evolving red heat initially and then white heat.
The main product was aluminum carbide in the first step and aluminum
nitride as well as carbide in the second step. From the measurements
of XPS spectra and the lattice constants, it was concluded that the
aluminum nitride obtained is solid solution with the composition of
(Al2OC)1-x(AlN)x. The effects of
mixing ratio of Al to C, grinding time, and gas atmosphere on the
formation of aluminum nitride are discussed.
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Ustichenko
V.A., Chistyakov A. A. Fused Material Based
on Alumina and Carbon // Ogneupory. - 1994. - 3. - 2-7. (Russian).
[no
abstract]
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Vardiman
R. G. Temperature-Induced Phase Development
in Titanium-Implanted Silicon Carbide // Mater. Sci. Eng. A
- 1994. - 177(1-2). - 209-215.
Silicon carbide has been implanted with titanium
at three different doses. TEM and RBS have been used to follow changes
resulting from post-implantation heat treatment. The as-implanted
layer is amorphous, and after a low temp. anneal a fine, nonequil.
titanium carbide ppt. appears in the amorphous matrix. At higher temps.,
the ternary phase Ti3SiC2 and the SiC crystallize.
The initial Gaussian titanium concn. profile changes near the ternary
phase pptn. temp., developing side peaks at the area of max. initial
concn. gradient. Thermodn. and kinetic factors in the obsd. phase
development are discussed, and the need for a metastable phase diagram
is considered.
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